• Nie Znaleziono Wyników

CLL4150

N/A
N/A
Protected

Academic year: 2022

Share "CLL4150"

Copied!
2
0
0

Pełen tekst

(1)

DESCRIPTION:

The CENTRAL SEMICONDUCTOR CLL4150 type is an ultra-high speed silicon switching diode manufactured by the epitaxial planar process, in a hermetically sealed glass surface mount package, designed for high speed switching applications.

MARKING CODE: CATHODE BAND.

CLL4150 HIGH SPEED SWITCHING DIODE

SOD-80 CASE

Central

Semiconductor Corp.

TM

R1 (26-September 2002) MAXIMUM RATINGS: (TA=25°C)

SYMBOL UNITS

Continuous Reverse Voltage VR 50 V

Peak Repetitive Reverse Voltage VRRM 50 V

Continuous Forward Current IF 300 mA

Peak Repetitive Forward Current IFRM 600 mA

Forward Surge Current, tp=1 µs IFSM 4.0 A

Forward Surge Current, tp=1 s IFSM 1.0 A

Power Dissipation PD 500 mW

Operating and Storage

Junction Temperature TJ,Tstg -65 to +200 °C

Thermal Resistance ΘJA 350 °C/W

ELECTRICAL CHARACTERISTICS (TA=25°C unless otherwise noted)

SYMBOL TEST CONDITIONS MIN MAX UNITS

BVR IR=5.0µA 75 V

IR VR=50V 100 nA

VF IF=1.0mA 0.54 0.62 V

VF IF=10mA 0.66 0.74 V

VF IF=50mA 0.76 0.86 V

VF IF=100mA 0.82 0.92 V

VF IF=200mA 0.87 1.0 V

CT VR=0, f=1.0 MHz 4.0 pF

trr IR=IF=10mA, RL=100Ω, Rec. to 1.0mA 4.0 ns

(2)

Central

Semiconductor Corp.

TM

SOD-80 CASE - MECHANICAL OUTLINE

CLL4150 HIGH SPEED SWITCHING DIODE

R1 (26-September 2002) MARKING CODE: CATHODE BAND

Cytaty

Powiązane dokumenty

The model is a combination of TTL method, the method for the reduc- tion of multilayer structures to an equivalent single layer microstrip line and the Kirschning and

O ryginalne środki w yrazu dla tem a tu chłopskiego znalazł „poeta Po- nid zia” w gwarze, w konw encji zbiorowego i indyw idualnego bo hatera chłopskiego

This channel had a compact return circuit resembling that of a wind tunnel (see ref. Ii] and Fig. 1) and the water emerged into the working section via the closed contraction

Można zaryzykować twierdzenie, że o ile w zakresie dziejów myśli pedagogicznej posiadamy sporo monograficznych i syntetycznych opracowań, o tyle w dwu pozo- stałych

Obok takiego naukowego n u rtu w podejściu do początków życia na Ziemi, w ostatnich latach pojawiły się publikacje o charakterze fantastyczno-naukow ym bądź

Silicon etching in TMAH is very slow for (111) crystal planes compared to other directions and this property is used to etch the silicon fins by exposing vertical (111) planes

The excellent agreement of the characteristics of the measured passive components and the TWA fabricated on SP HRS with the simulated characteristics based on EM simulation and HRS

Anisotropic properties of silicon etching using tethra-methyl-ammonium-hydroxide (TMAH) have already been utilized on (110) silicon wafers to form nearly perfectly vertical