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Delft University of Technology

Erratum

The inactivation mechanism of chemical disinfection against SARS-CoV-2: The MD and

DFT perspectives(RSC Advances (2020) 10 (40480–40488) DOI: 10.1039/D0RA06730J)

Tan, Chunjian; Gao, Chenshan; Zhou, Quan; Van Driel, Willem; Ye, Huaiyu; Zhang, Guoqi

DOI

10.1039/d0ra90127j

Publication date

2021

Document Version

Final published version

Published in

RSC Advances

Citation (APA)

Tan, C., Gao, C., Zhou, Q., Van Driel, W., Ye, H., & Zhang, G. (2021). Erratum: The inactivation mechanism

of chemical disinfection against SARS-CoV-2: The MD and DFT perspectives(RSC Advances (2020) 10

(40480–40488) DOI: 10.1039/D0RA06730J). RSC Advances, 11(6). https://doi.org/10.1039/d0ra90127j

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(2)

Correction: The inactivation mechanism of

chemical disinfection against SARS-CoV-2: from

MD and DFT perspectives

Chunjian Tan,

abd

Chenshan Gao,

c

Quan Zhou,

c

Willem Van Driel,

af

Huaiyu Ye*

bde

and Guoqi Zhang*

a

Correction for‘The inactivation mechanism of chemical disinfection against SARS-CoV-2: from MD and DFT perspectives’ by Chunjian Tan et al., RSC Adv., 2020, 10, 40480–40488, DOI: 10.1039/D0RA06730J.

The authors regret that one of the affiliations (affiliation f) was incorrectly omitted in the original manuscript. The corrected list of

affiliations is as shown below.

The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.

aElectronic Components, Technology and Materials, Del University of Technology, 2628 CD Del, The Netherlands. E-mail: G.Q.Zhang@tudel.nl bSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, China. E-mail: yehy@sustech.edu.cn

cThe Key Laboratory of Optoelectronic Technology & Systems, Education Ministry of China, College of Optoelectronic Engineering, Chongqing University, Chongqing 400044,

China

dShenzhen Institute of Wide-Bandgap Semiconductors, No. 1088, Xueyuan Rd, Xili, Nanshan District, Shenzhen, Guangdong, China

eEngineering Research Center of Integrated Circuits for Next-Generation Communications, Ministry of Education, Nanshan District, Shenzhen, Guangdong, China fSignify, High Tech Campus 7, 5656AE Eindhoven, The Netherlands. E-mail: Willem.van.driel@signify.com

Cite this: RSC Adv., 2021, 11, 3509

DOI: 10.1039/d0ra90127j rsc.li/rsc-advances

© 2021 The Author(s). Published by the Royal Society of Chemistry RSC Adv., 2021, 11, 3509 |3509

RSC Advances

CORRECTION

Open Access Article. Published on 15 January 2021. Downloaded on 2/11/2021 12:18:37 PM.

This article is licensed under a

Creative Commons Attribution 3.0 Unported Licence.

View Article Online

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