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Table of content
1. Introduction ... 6
2. Organic light-emitting diodes ... 9
2.1.Organic semiconductors ... 10
2.2.Electroluminescence ... 15
2.2.1. Electronic states of a molecule ... 18
2.3.Materials and architecture of the OLEDs. ... 19
2.4.OLEDs degradation ... 26
3. The vapor deposition ... 32
3.1.Physical vapor deposition ... 32
3.2.Chemical vapor deposition methods ... 33
3.2.1. Plasma-assisted chemical vapor deposition method ... 36
3.2.2. Effect of the CVD processing parameters on the growth rate of the layers ... 38
4. Amorphous carbon and carbon nitride layers ... 43
4.1.Classification and brief characteristic of carbon and carbon nitride layers ... 43
4.2.Structure of carbon and carbon nitride layers... 47
5. Objectives, motivation and methods of the studies. ... 50
6. a-C:N:H layers: technology and characterization methods ... 53
6.1.PACVD system ... 53
6.2.Methods of characterization ... 55
6.3.Materials ... 63
7. Chemical vapor deposition repeatability ... 65
7.1.Deposition... 65
7.2.Comparison of the layers from anode and cathode. Statistical analysis... 66
7.3.Summary... 77
8. Structural and optical characterization of a-C:N:H layers deposited by PACVD at various conditions ... 80
8.1.Experimental... 80
8.2.Structural studies. Comparison of the layers deposited at various conditions. ... 82
8.3.Growth rate and optical properties of the layers deposited at various conditions. ... 89
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8.5.Summary ... 99
9. Thermal stability of a-C:N:H layers ... 101
9.1.Samples ... 101
9.2.Effect of the temperature on the atomic structure and optical properties of a-C:N:H layers. ... 102
9.3.Summary ... 104
10. Passivation of light-emitting diodes ... 106
10.1.OLEDs technology ... 106
10.2.Summary ... 111
11. Summary and conclusions ... 112
Bibliography ... 114
List of Figures ... 128
