Photocopying permitted by license only
TWO-DIMENSIONAL
COMPUTER MODELLING
OF
POLYCRYSTALLINE FILM GROWTH
AJ.
D
AMMERS AND
S.
RADELAAR
DIMES
/SectionSubmicronTechnology,Laboratory
of
AppliedPhysics,Delft
Universityof
Technology,
P.O.
Box
5046, 2600GA Delft,
theNetherlandsAbstract. Polycrystallinethinfilms, deposited fromavapour phase, often show a columnar morphology.
We
presentcomputer simulations of a 2D model of the polycrystalline
growth process. The model consists of randomly oriented
squares, growing from aline.
We
find, that the characteristiclength scale
<Ax>
of the growingsurface (average edge length projected on thesubstrate)
diverges as a function of time accordingtoapowerlaw<Ax>-
tP,withp 0.52.1. INTRODUCTION
Thin solidfilms,grownfromavapourphasewithtechniques suchas
sputtering, evaporation or chemical vapour deposition, often have a
columnar morphology. The intrinsic structure of these columns may be
amorphousorcrystalline.Thisdependsontheprocessconditions (substrate
temperature, gas pressure etc.) and essentiallyitrelates to the mobility of
the adatomson the surface during deposition. 1, 2
In
the low mobility regime amorphouslayers areformed.Computer
simulations of atomistic (ballistic
deposition)3,
4 and continuummodels 5,6, 7, 8 have given a great deal of insight into the factors governing this growth process. Majorphysical concepts
(relevant
to e.g.evaporationor sputterdeposition)canberoughlysummarized asfollows.
A
surface element collects an amount of material, which depends on its
orientationrelativetotheincomingflux.
Atoms
are assumedtohave a mean freepath,which islargerthantypicalheight differences of the substrate, soprotrudingparts of the surface collectmaterial atthe
expense
of regionsfurtherdown thevapourstream.
On
the other hand, theeffectofthisnon-uniformdeposition is counteractedbyredistributionof thematerialoverthe
surface, which
may
vary from local restructuringtolong rangediffusion. Thenetresultwillbe,atmoderatedegreesofatomicmobility, formation of columns, originating fromfavourablylocatedsurface regions.If the deposited material has sufficiently high mobility, the
shadowing phenomenon described above will no longer be adequate to cause texture formation.
However,
now another mechanismappears
to become active. Crystals nucleate on the substrate and grow freely untilimpingement.
Subsequendy,
these growingdomains compete for survival and columnsareformed.Due
totheintrinsicgrowthanisotropy(facets)of thecrystals, crystallographictextureappearstodevelop. Crystalswith their fastest growing directions perpendicular to the substrategrow
at theexpenseof less favourablyorientedones. This "principle of evolutionary selection" wasproposed by
Van
derDrift9in ordertoexplain preferential crystallographic orientation, as observed experimentally for numeroussystems.
In
order to gain more insight into the morphology of columnar polycrystallinelayers, wedevelopeda2D computer model simulating the growth of such f’dms. Clearly, it hasits limitationscompared toatrue 3Dapproach, butwe willshow thatevensuch asimple model has non-trivial
properties. In particular, the long time behaviour of the (2D) growth process appearsto be qualitatively similarto (3D) experimental data. 0
Moreover,
ourresults for polycrystallinelayersarecomparabletorecentlyobtainedbehaviourof growingamorphous layers.7
2.
SIMULATIONS
The 2D model which we study in this paperconsists of a line of
length
L,
on whichrandomlyorientedequidistantsquare crystals (spacingd)nucleate simultaneously (Fig. 1).Thegrowthrate(thickness of thelayer
depositedper second) ofalledges isg.
As
a convenient unitoftime tweuse
{d/g }. In
order to minimize finite size effects, periodic boundaryconditionsareapplied.
In
thestatisticalanalysisofthesimulationswefocusonsurface features.
A
top viewof thelayeryields the projectededge lengthDetails of the computer implementation of this model were reported previously. 11 Deposition Flux
Ax
Periodic Boundary ConditionsFigure 1. Model system studied in this paper.
A
line oflength
L
is initially covered with randomly oriented crystalnuclei(squares) positionedatregularintervals(spacing d).All
crystal edges growwith the same rateg. Periodic boundary
conditions areemployed,zixisthelengthofanedge, projected
onthesubstrate.
The result ofatypicalsimulation isgiveninFig. 2. Essentiallythis is
theclassicalexample ofVanderDrift
9.
Clearlyoneobserves the "principleofevolutionaryselection". Crystalswithadirectionof fastestgrowthmore orless perpendiculartothe substrategrowattheexpenseoflessfavourably
oriented ones. This leads to the well known columnar structure with
Figure 2. Growth of randomly oriented squares from a
line. The squaresnucleate simultaneously andgrow atequal
rates. This is a detail of a larger simulation, so periodic boundaryconditionsarenotvisible.
FromFig. 2onemaygetthe impression that afteran initialperiod the surface profile reaches a steady state.
However,
the coarsening processcontinues. Thisphenomenoncanbeformulatedin a morequantitativeway,
by looking at the behaviour of the scaled average projected edge length
<Ax>/L with time
#. In
Fig. 3 we present log(<Ax>/L) as a function oflog(t)
forasystem of5000 squares,as obtainedby averagingthe results of4 simulations. Clearly, a linearrelationshipexists, whichimplies apower
law
<Ax>
t P (1)withp 0.52.
-3 slope 0.52
0 1 2 3 4 5 6
log(t)
Figure 3. The (scaled) average projected edge length
<zlx>/Las a functionoftime t, given in units of
{
d/g}.
Theinitial configuration consists of5000 equidistant, randomly
oriented,squares. Thisgraph was obtainedbyaveragingover
4runs(different setsof randomnumbers).
3.
DISCUSSION
The results of the simulationspresented here unifiypolycrystalline
filmgrowth with evolutionof surfaces ofamorphous layers.
Tang
etal.7 reduced a continuum model for growth of amorphous layers5,6 to theevolution of isotropic wave fronts, originating from the initial surface.
Essentially,the columns are then determinedbythe wavesrelatedto
(local)
maximaof the surface profile.
In
otherwords, the long-timebehaviourofthe surface is indistinguishable from that of one, which originates from
isotropically growingisolateddomains, althoughthe real initial surface is
continuous. Thus, themaindifferencebetween ourpolycrystallinemodel
andtheamorphousone citedaboveisthe anisotropyofthegrowthrates,as
reflectedinthe
presence
ofcrystalfacets.This qualitative similarity between evolution of amorphous and
polycrystalline layersisenhancedbyourquantitativeresults.
Tang
etal.7also found a
power
law like(1)
for 2D as well as 3D amorphous modelinitialheightdistributionand moreoverby addingnoise.
Some (3D)
resultsappearedto agreewithpowerlawbehaviourofsputtered amorphous SiC
films, as observed experimentally by
Roy
and Messier10.
In
the latterpaper
also apower law wasreported for polycrystalline SiC films. Thisindicates thatour simulations relate to essential features ofevolution of
polycrystalline surfaces, but as we only studied a 2D model system, statementsabout quantitative agreement would be premature.
Further simulations on systems with various crystal shapes and distributions of initialsizes, positions andorientations arein
progress. On
the otherhand,itwould be quite interestingto analysemoreexperimental data, in particular on materials other than SiC, in order to assess the universality ofpowerlaw behaviour forgrowing polycrystallinccolumnar thin films.
REFERENCES
1.
B.A.
MovchanandA.V.
Demchishin,Phys.Met.
Metallogr.USSR
28, 83
(1969).
2.
J.A.
Thornton, Ann.Rev.
Mater. Sci. 7, 239 (1977).3. H.J.
Leamy,
G.H.
GilmerandA.G.
Dirks, in: CurrentTopicsinMaterialsScience, Vol.6,
E.
Kaldis (Ed.),NorthHolland, Amsterdam(1980), pp. 309-344.
4. P.Meakin,CRCCriticalReviewsin SolidStateandMaterials Science
13, 143 (1986).
5. M. Kardar,G. Parisi and Y. Zhang,Phys. Rev. Lett. 56, 889
(1986).
6. G.S. Bales andA. Zangwill, Phys.Rev. Lett. 63, 692 (1989).
7.
C.
Tang,
S.
Alexander andR.
Bruinsma,Phys.Rev. Lett.
64,772 (1990).8.
G.S.
Bales,R. Bruinsma,E.A.
Eklund,R.P.U.
Karunasiri,J.
RudnickandA.
Zangwill, Science249, 264(1990),
and referencestherein.
9.
A.
van derDrift,PhilipsRes. Repts. 22, 267 (1967).10.
R.A.
Roy
andR.
Messier,Mat.Res.
Soc.Symp. Proc.
38, 363(1985).
11.
A.J. Dammers
andS.Radelaar,In: SemiconductorSilicon1990[Proceedings of theSixth InternationalSymposiumon Silicon
MaterialsScienceandTechnology,Montreal